Electrochemical investigation of the autocatalytic deposition of Ni-Cu-P alloys
Identifieur interne : 000520 ( France/Analysis ); précédent : 000519; suivant : 000521Electrochemical investigation of the autocatalytic deposition of Ni-Cu-P alloys
Auteurs : E. Chassaing [France] ; M. Cherkaoui [Maroc] ; A. Srhiri [Maroc]Source :
- Journal of Applied Electrochemistry [ 0021-891X ] ; 1993-11-01.
Abstract
Abstract: Autocatalytic deposition of Ni-Cu-P alloys (55-65 wt % Ni, 25-35 wt % Cu, 7-10 wt %P) has been carried out. It is shown that the hypophosphite concentration must be higher than a certain threshold to induce the autocatalytic process. The impedance behaviour exemplifies the kinetic evolution: a large capacitive loop with a high-frequency inflection when only chemical displacement occurs and two well-defined capacitive features when the autocatalytic process is achieved. Mutual interactions occur between partial oxidation and reduction reactions which are both depolarized as compared to the separate reactions. In addition, phosphorus incorporation is always reduced when the copper content increases. A pH increase accelerates the plating process though it inhibits the cathodic discharge and reduces the copper content.
Url:
DOI: 10.1007/BF00625591
Affiliations:
Links toward previous steps (curation, corpus...)
- to stream Istex, to step Corpus: 000531
- to stream Istex, to step Curation: 000265
- to stream Istex, to step Checkpoint: 000973
- to stream Main, to step Merge: 001118
- to stream Main, to step Curation: 001058
- to stream Main, to step Exploration: 001058
- to stream France, to step Extraction: 000520
Links to Exploration step
ISTEX:D276BEAFA68E4B515EFD58C6225193C2D64F06BELe document en format XML
<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title xml:lang="en">Electrochemical investigation of the autocatalytic deposition of Ni-Cu-P alloys</title>
<author><name sortKey="Chassaing, E" sort="Chassaing, E" uniqKey="Chassaing E" first="E." last="Chassaing">E. Chassaing</name>
</author>
<author><name sortKey="Cherkaoui, M" sort="Cherkaoui, M" uniqKey="Cherkaoui M" first="M." last="Cherkaoui">M. Cherkaoui</name>
</author>
<author><name sortKey="Srhiri, A" sort="Srhiri, A" uniqKey="Srhiri A" first="A." last="Srhiri">A. Srhiri</name>
</author>
</titleStmt>
<publicationStmt><idno type="wicri:source">ISTEX</idno>
<idno type="RBID">ISTEX:D276BEAFA68E4B515EFD58C6225193C2D64F06BE</idno>
<date when="1993" year="1993">1993</date>
<idno type="doi">10.1007/BF00625591</idno>
<idno type="url">https://api.istex.fr/document/D276BEAFA68E4B515EFD58C6225193C2D64F06BE/fulltext/pdf</idno>
<idno type="wicri:Area/Istex/Corpus">000531</idno>
<idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">000531</idno>
<idno type="wicri:Area/Istex/Curation">000265</idno>
<idno type="wicri:Area/Istex/Checkpoint">000973</idno>
<idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Checkpoint">000973</idno>
<idno type="wicri:doubleKey">0021-891X:1993:Chassaing E:electrochemical:investigation:of</idno>
<idno type="wicri:Area/Main/Merge">001118</idno>
<idno type="wicri:Area/Main/Curation">001058</idno>
<idno type="wicri:Area/Main/Exploration">001058</idno>
<idno type="wicri:Area/France/Extraction">000520</idno>
</publicationStmt>
<sourceDesc><biblStruct><analytic><title level="a" type="main" xml:lang="en">Electrochemical investigation of the autocatalytic deposition of Ni-Cu-P alloys</title>
<author><name sortKey="Chassaing, E" sort="Chassaing, E" uniqKey="Chassaing E" first="E." last="Chassaing">E. Chassaing</name>
<affiliation wicri:level="3"><country xml:lang="fr">France</country>
<wicri:regionArea>Centre d'Etudes de Chimie Métallurgique - CNRS, 15 rue G. Urbain, 94407, Vitry-sur-Seine</wicri:regionArea>
<placeName><region type="region" nuts="2">Île-de-France</region>
<settlement type="city">Vitry-sur-Seine</settlement>
</placeName>
</affiliation>
</author>
<author><name sortKey="Cherkaoui, M" sort="Cherkaoui, M" uniqKey="Cherkaoui M" first="M." last="Cherkaoui">M. Cherkaoui</name>
<affiliation wicri:level="1"><country xml:lang="fr">Maroc</country>
<wicri:regionArea>Faculty of Sciences, Department of Chemistry, Ibn Tofail University, Kenitra</wicri:regionArea>
<wicri:noRegion>Kenitra</wicri:noRegion>
</affiliation>
</author>
<author><name sortKey="Srhiri, A" sort="Srhiri, A" uniqKey="Srhiri A" first="A." last="Srhiri">A. Srhiri</name>
<affiliation wicri:level="1"><country xml:lang="fr">Maroc</country>
<wicri:regionArea>Faculty of Sciences, Department of Chemistry, Ibn Tofail University, Kenitra</wicri:regionArea>
<wicri:noRegion>Kenitra</wicri:noRegion>
</affiliation>
</author>
</analytic>
<monogr></monogr>
<series><title level="j">Journal of Applied Electrochemistry</title>
<title level="j" type="abbrev">J Appl Electrochem</title>
<idno type="ISSN">0021-891X</idno>
<idno type="eISSN">1572-8838</idno>
<imprint><publisher>Kluwer Academic Publishers</publisher>
<pubPlace>Dordrecht</pubPlace>
<date type="published" when="1993-11-01">1993-11-01</date>
<biblScope unit="volume">23</biblScope>
<biblScope unit="issue">11</biblScope>
<biblScope unit="page" from="1169">1169</biblScope>
<biblScope unit="page" to="1174">1174</biblScope>
</imprint>
<idno type="ISSN">0021-891X</idno>
</series>
</biblStruct>
</sourceDesc>
<seriesStmt><idno type="ISSN">0021-891X</idno>
</seriesStmt>
</fileDesc>
<profileDesc><textClass></textClass>
<langUsage><language ident="en">en</language>
</langUsage>
</profileDesc>
</teiHeader>
<front><div type="abstract" xml:lang="en">Abstract: Autocatalytic deposition of Ni-Cu-P alloys (55-65 wt % Ni, 25-35 wt % Cu, 7-10 wt %P) has been carried out. It is shown that the hypophosphite concentration must be higher than a certain threshold to induce the autocatalytic process. The impedance behaviour exemplifies the kinetic evolution: a large capacitive loop with a high-frequency inflection when only chemical displacement occurs and two well-defined capacitive features when the autocatalytic process is achieved. Mutual interactions occur between partial oxidation and reduction reactions which are both depolarized as compared to the separate reactions. In addition, phosphorus incorporation is always reduced when the copper content increases. A pH increase accelerates the plating process though it inhibits the cathodic discharge and reduces the copper content.</div>
</front>
</TEI>
<affiliations><list><country><li>France</li>
<li>Maroc</li>
</country>
<region><li>Île-de-France</li>
</region>
<settlement><li>Vitry-sur-Seine</li>
</settlement>
</list>
<tree><country name="France"><region name="Île-de-France"><name sortKey="Chassaing, E" sort="Chassaing, E" uniqKey="Chassaing E" first="E." last="Chassaing">E. Chassaing</name>
</region>
</country>
<country name="Maroc"><noRegion><name sortKey="Cherkaoui, M" sort="Cherkaoui, M" uniqKey="Cherkaoui M" first="M." last="Cherkaoui">M. Cherkaoui</name>
</noRegion>
<name sortKey="Srhiri, A" sort="Srhiri, A" uniqKey="Srhiri A" first="A." last="Srhiri">A. Srhiri</name>
</country>
</tree>
</affiliations>
</record>
Pour manipuler ce document sous Unix (Dilib)
EXPLOR_STEP=$WICRI_ROOT/Wicri/Terre/explor/NickelMaghrebV1/Data/France/Analysis
HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 000520 | SxmlIndent | more
Ou
HfdSelect -h $EXPLOR_AREA/Data/France/Analysis/biblio.hfd -nk 000520 | SxmlIndent | more
Pour mettre un lien sur cette page dans le réseau Wicri
{{Explor lien |wiki= Wicri/Terre |area= NickelMaghrebV1 |flux= France |étape= Analysis |type= RBID |clé= ISTEX:D276BEAFA68E4B515EFD58C6225193C2D64F06BE |texte= Electrochemical investigation of the autocatalytic deposition of Ni-Cu-P alloys }}
This area was generated with Dilib version V0.6.27. |